N.M.A. RASHID; R. RITIIKOS; B.T. GOH; S.M.A. GANI; M.R. MUHAMAD; S.A. RAHMAN. EFFECTS OF THERMAL ANNEALING ON THE PROPERTIES OF HIGHLY REFLECTIVE nc-Si:H/a-CNx:H MULTILAYER FILMS PREPARED BY  r. f. PECVD TECHNIQUE. Solid State Science and Technology, [S. l.], v. 19, n. 1, p. 132–137, 2026. Disponível em: https://journal.massmalaysia.org/ojs/index.php/ssst/article/view/206. Acesso em: 27 jul. 2026.