C. H. Shi, B. T. Goh, R. Ritikos, S. M. Ab. Gani, M. R. Muhamad, and S. A. Rahman, “DEPOSITION OF HYDROGENATED NANOCRYSTALLINE SILICON (nc-Si:H) FILMS BY PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITION”, Solid State Sci. Technol., vol. 15, no. 2, pp. 92–97, Apr. 2026, doi: 10.66514/.