SELF-ALIGNED PHOTONIC CRYSTAL VERTICAL-CAVITY SURFACE EMITTING LASER BY PHOTOLITHOGRAPHY TECHNIQUE

Authors

  • Mohd Sharizal Alias Microelectronic & Nanotechnology Program, TMR&D, 63000 Cyberjaya, Selangor Malaysia Author
  • Sahbudin Shaari Institute of Microengineering & Nanoelectronics, UKM, 43600 Bangi, Selangor Author
  • Dee Chang Fu Institute of Microengineering & Nanoelectronics, UKM, 43600 Bangi, Selangor Author

Keywords:

Photonic crystal, VCSEL, Semiconductor laser

Abstract

In this paper, we report on single-mode operation of originally multi-mode oxide VCSEL by using etched photonic crystal air holes and unique trench structure. The device fabrication utilized conventional photolithography; with simplified lithography step of self-aligning the photonic crystal and trench structures to the laser aperture for efficient and vigorous device processing. The fabricated photonic crystal VCSEL with trench device exhibits a single-mode output power of 0.7 mW, threshold current of 3.5 mA, slope efficiency of 0.10 W/A, and continuous single-mode output spectra at wide operating current range. The results are compared with conventional multi-mode oxide VCSEL of similar device geometry. It is demonstrated that a highly confined and continuous single mode operation of VCSEL can be achieved by etching of photonic crystal air holes at the laser facet using a simple photolithography technique.

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Published

14-06-2026