STUDY ON THE ELECTRICAL, STRUCTURAL AND OPTICAL PROPERTIES OF NANOSTRUCTURED TIO2 THIN FILM PREPARED BY DIFFERENT SOL-GEL PRECURSOR

Abstract

Two types of nanostructured Titanium Dioxide (TiO2) thin films have been deposited onto silicon and glass substrates. Titanium Isopropoxide (TTIP) and Titanium Butoxide (TBOT) have been use as a precursor for the nanostructured TiO2 thin films. Comparison of electrical properties, structural properties and optical properties of the two different type nanostructured TiO₂ thin films has been studied. Nanostructured TiO₂ thin films have been prepared by sol-gel method and deposited onto substrate using spin coating technique. For the electrical properties, nanostructured TiO₂ thin film using TTIP as precursor gives lower resistance compared to nanostructured _TiO2 thin film from TBOT. As for structural properties, there is no significant difference on the crystalinity and the crystallite size. Furthermore, both of the nanostructured thin films give crystalline anatase phase. Finally for the optical properties, transmittance percentage for TTIP based thin film gives higher percentage than TBOT based thin film. Both of transmittance properties of the nanostructured TiO₂ thin film are more than 80% and fully absorb UV light at 300nm of wavelength. The result suggested that TTIP based nanostructured TiO₂ thin film can be use in photo-voltaic application due to low resistance and high of transmittance properties.